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sample. The prepared sample is further annealed at 300℃ and 600℃ for 3h in furnace named

               as S1 and S2, respectively.
               Characterizations

               The ready samples are characterized by best suitable experimental technique as like: XRD,
               TEM, UV-Visible and Fluorescence. XRD sequence obtained through X’PERT PRO X-Ray

               Diffractometer which operated at 45kV and 40 mA with Cu Kα monochromatic energy of
               wavelength  1.540  Å.  Thermally  treated  sample  at  the  temperature  of  300℃  and  600℃

               produced  nanoscale  crystal  structure  morphology  using  Hitachi-4500  TEM.  Optical

               absorption spectra are obtained in wavelength range ~ 200-900 nm via Perkin Elmer Lambda
               750 spectrophotometer. Finally, the last but not least fluorescence spectra originate by Perkin

               Elmer Fluorescence spectrometer (model LS-55).

               RESULTS AND DISCUSSION
               X-Ray Diffraction (XRD) Analysis

               The obtained XRD sequence for thermally treated samples S1 and S2 of samarium doped
               silica nanopowder is displays in Fig. 1. There was no specific crystalline phase observed in

               sample S1 which is annealed at 300℃. This type of XRD sequence with broad hump and
               irregular peaks strictly verifies the amorphous nature of sample. Broad hump originates at 2θ

               ~ 22.63° and 45.41° recognized to amorphous silica in sample S1 (300℃) linked to JCPDS

               card no. 29-0085 [11]. Amorphous nature of sample S1 create due to majority of precursors
               and  impurities  at  ow  annealed  temperature  (300℃).  The  small  hump  about  2θ  ~  43.6°,

                                                3+
               displays that the activator ion (Sm ) can be arbitrarily dispersed in the SiO2 network [12].
               As we increase the annealed temperature from 300℃ to 600℃, some interesting changes are

               obtained  in  the  XRD  sequence  of  sample  S2.  The  wide  bands  are  almost  disappeared  in
               sample S2 when the sample is thermally treated at 600℃ which give indication about the

               well dispersion of samarium ions in the pore of silica networking structure.


























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